[KAIST OOEM 연구실]

For bottom-up method, we try to overcome the previous limitations of the existing technology by using nano-patterns and structure control using defects in liquid crystals and self-assembly of organic supramolecules. As a top-down method, secondary sputtering lithography was introduced for the first time to diversify the pattern size and shape that were difficult to produce in existing techniques. By utilizing these nanofabrication techniques, our group aims to develop optimal nanostructures for climate change and next-generation electronic devices issues. 2026 Advanced Materials in Chemiresistive Gas Sensors ACS Sens.